Robot for Semiconductor
MTCR41604-Axis Cylindrical Coordinate Clean Robot
Product Video
VIDEO
Usage Environment/Specifications
Product Profile
Model Name MTCR4160
Environment Clean room atmosphere
Arm Twin arm
Operating Range 315mm (3rd joint center)
Vertical Stroke 300mm / 400mm / 500mm
Payload Capacity 4kg (calculated for the arm 3rd joint)
List of Product Model
Product Model Vertical Stroke
Standard MTCR4160-300-AM 300mm
MTCR4160-400-AM 400mm
MTCR4160-400-AM 500mm
The image above and the video are of MTCR4160-300-AM.
Characteristics
Designed for handling 300mm wafers in a production line or inspection line of semiconductor.
High-speed handling by AC servo motor and superior cost performance compared to MTHR type.
Certified CE marking.
Execution of origin search is not required by using the servo motors with absolute encoders.
Arm lineup: 160mm, 200mm
Twin-arm reduces the wafer swap time.
Base or flange mounting type is selectable.
Motion monitoring is available.
RS232C and parallel photo I/O are standard for control.
AC servo motor installed in all axes.
High-speed, high-accuracy wafer handlingby S-curved speed control.
Wafer holding: end-effector with vacuum suction, passive edge, edge grip, or Bernoulli type End-effector.
End-effector material: CFRP, Al, ceramic, or others.
Optimal end-effector is selectable according to the carrying object and line layout.
Standard Specifications
Example of standard specifications with JEL standard end-effector (vacuum type)
Robot Model
MTCR4160-300-AM
Carrying Object
Wafer up to 300mm
Wafer Holding Method
By vacuum suction
Robot Model Type
Cylindrical coordinate type
Control Axis
4-axis
Motor Type
AC servo motor
Operating Range
From the robot center to the wafer center
Rotation Angle (Theta-axis)
Vertical Stroke (Z-axis)
575mm
340deg
300mm
Carrying Speed(Ave.)
Arm (R-axis)
Rotation Angle (Theta-axis)
Vertical Stroke (Z-axis)
850mm/sec
340deg/sec
330mm/sec
Carrying Speed (Max.)
Arm (R-axis)
Rotation Angle (Theta-axis)
Vertical Stroke (Z-axis)
1800mm/sec
550deg/sec
500mm/sec
Resolution
Arm (R-axis)
Rotation Angle (Theta-axis)
Vertical Stroke (Z-axis)
Below 9.82µm
0.0015deg
1.96µm
Handling level
674.5mm (Base mounting level to end-effector level)
Repeatability
Within ±0.1mm
Cleanliness
ISO Class 2 (at wafer transfer level when exhausting driving part)
Utility
Power: AC200V single phase ±10% 3kVA; Vacuum: -53kPa or more
Controller Model
C5000S series
Interface
RS232C and parallel photo I/O
Option
End-Effector
Model Name
Size of Carrying Object
End-effector Type (Thickness)
Wafer Holding Method
SC-IW-200
3 inch, 100mm to 200mm
I-shape (2mm)
Vacuum suction
SC-IW-240
3 inch, 100mm to 300mm
I-shape (2mm)
Vacuum suction
SC-YW-200
100mm to 200mm
Y-shape (2mm)
Vacuum suction
SC-YW-227
100mm to 300mm
Y-shape (2mm)
Vacuum suction
SC-YW-240
100mm to 300mm
Y-shape (2mm)
Vacuum suction
3D-02229
150mm~300mm
Y-shape (2mm)
Vacuum suction
SC3-YW-240
300mm
Y-shape (3mm)
Vacuum suction
3D-01661
300mm
Y-shape (3mm)
Vacuum suction
SC3-IW-240
300mm
I-shape (3mm)
Vacuum suction
*The table above shows the specifications of JEL standard end-effectors. The other specifications are available.
*Click the items below to review the end-effectors other than JEL standard types.
Other Option
Product Lineup